Group Members

Aloke Paul
aloke[a]materials.iisc.ernet.in
Raju Ravi
rravi[a]materials.iisc.ernet.in
Soumitra Roy
soumitra[a]platinum.materials.
iisc.ernet.in
Kruthika P.
kruthika[a]platinum.materials.
iisc.ernet.in
Sangeeta Santra
sangeeta.santra[a]gmail.com
Bibhudutta Mishra
bibhu@platinum.materials.iisc.ernet.in
Varun Baheti
iisc1909[at]gmail.com
Degree conferred
Soma Prasad (Ph.D.)
Divya V. D. (Ph.D.)
Avik Mondal (M.E.)
Sangeeta Santra (ME)
Adepalli Kiran Kumar (ME)
SomaSurendra Balam (ME)
Chirantan Ghosh (PhD)

Soma Prasad

Education

Doctor of Philosophy (Ph.D.): Department of Materials Engineering, Indian Institute of Science, Bangalore, India (2006 – 2011)
Project: Growth mechanism of the phases by interdiffusion and microstructural stability of Nb-based silicide.
Master of Technology (M. Tech.): Materials and Metallurgical Engineering, Indian Institute of Technology, Kanpur, India (1998-2000)
Bachelor of Engineering (B.E.): Metallurgical Engineering, BIT Sindri, Vinoba Bhave University, Hazaribagh, India (1994-1998)

Professional Experience

I Joined TATA STEEL in July 2000 as a Graduate Trainee and since July 2001 worked as Researcher in Automation Division of Tata Steel, Jamshedpur. I was associated with Level 2 automation of Blast Furnaces and hot strip Mill. Then I left TATA STEEL in December 2005 to join IISc, Bangalore for Ph.D. program.

Publications

S. Prasad and A. Paul, Effect of alloying additions on the solubility limit and the phase evolutions in the Nb-Si-X (X= Ti, Mo, Zr, Cr and Al) systems, submitted, 2012.
S. Prasad and A. Paul, Growth mechanism of the Nb(X)Si2 and [Nb(X)]5Si3 phases by reactive diffusion in Nb (X = Ti, Mo, or Zr)-Si systems, Intermetallics 22 (2012) 210.
S. Prasad and A. Paul, Diffusion mechanism in XSi2 and X5Si3 (X = Nb, Mo, V), accepted, Defects and Diffusion Forum, 2012.
S. Prasad and A. Paul, Interdiffusion in Nb-Mo, Nb-Ti and Nb-Zr systems, accepted, Defects Diffusion Forum, 2012.
S. Prasad and A. Paul, Growth and consumption of the phase layers during interdiffusion in a diffusion couple with finite end member, Journal of Materials science: Materials in Electronics, Journal of Materials Science: Materials in Electronics 23 (2012) 75-85.
S. Prasad and A. Paul, Growth mechanism of phases by interdiffusion and atomic mechanism of diffusion in the molybdenum-silicon system, Intermetallics, 19 (2011) 1191.
S. Prasad and A. Paul, Reactive diffusion between Vanadium and Silicon, available online, Journal of Phase Equilibria and Diffusion, 2011.
S. Prasad and A. Paul, An overview of diffusion studies in the V-Si system, Defects and Diffusion Forum 312-315 (2011) 731.
S. Prasad and A. Paul, Growth mechanism of phases by interdiffusion and diffusion of species in the Nb-Si system, Acta Materialia 59 (2011) 1577.
S. Prasad and A. Paul, Diffusion parameters in the Nb-Mo system: Revisited, Metallurgical and Materials Transactions A 40 (2009) 1512
S. Prasad and A. Paul, Theoretical consideration on the formation of nanotube following the Kirkendall effect, Applied Physics Letters, 90 (2007) 233114

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